I. Chris-Okoro, S. Cherono, W. Akande, S. Nalawade, M. Liu, C. Martin, V. Craciun, R. S. Kim, J. Mahl, T. Cuk, J. Yano, E. Crumlin, J. D. Schall, S. Aravamudhan, M. D. Mihai, J. Zheng, L. Zhang, G. Hautier, and D. Kumar
Optical and Plasmonic Properties of High-Electron-Density Epitaxial and Oxidative Controlled Titanium Nitride Thin Films
The Journal of Physical Chemistry C
129
3762-3774
(2025)